Industry Insights 03 Jan 2026 views ( )

DNP Achieves 10-Nanometer Line Pattern Resolution on Nanoimprint Templates for Advanced Semiconductors

Dai Nippon Printing Co., Ltd. (DNP, TOKYO:7912) today announced the successful development of a nanoimprint lithography (NIL) template with circuit linewidths of 10 nanometers (nm, 10?? meters). This new template enables patterning equivalent in performance to logic semiconductors based on the 1.4-nanometer process, meeting the miniaturization demands of advanced logic semiconductors.

Development Background and Objectives

In recent years, as device precision has increased, market demand for miniaturization of advanced semiconductors has grown significantly, driving advancements in production using extreme ultraviolet (EUV) lithography. However, EUV lithography requires substantial capital investment in production line setup and exposure processes, along with high energy consumption and operational costs.

DNP has been engaged in NIL template development since 2003, successfully accumulating extensive technical expertise in high-precision patterning.

In this latest advancement, DNP has developed an NIL template featuring 10-nm line patterns. It can replace certain EUV lithography processes, enabling customers without access to EUV production capabilities to manufacture advanced logic semiconductors.

Main Features

• DNP utilized self-aligned double patterning (SADP) technology to successfully develop the new 10-nm NIL template. This technique doubles pattern density by applying film deposition and etching processes to patterns initially formed by lithography equipment.
• This technology also reduces energy consumption during the exposure phase of advanced semiconductor manufacturing. Thanks to energy-efficient ultra-fine semiconductor processing enabled by NIL technology, energy use can be reduced to approximately one-tenth of current exposure methods, such as argon fluoride (ArF) immersion lithography and EUV lithography.

Future Plans

DNP has initiated evaluation of the NIL templates and aims to achieve mass production by 2027. The company will continue advancing NIL template development and increasing production capacity to meet growing demand, targeting NIL sales of 4 billion yen by the fiscal year ending 2030.

Further Information

About DNP

Founded in 1876, DNP has become a global leader, leveraging printing technologies to pioneer innovative business opportunities while prioritizing environmental sustainability and striving to build a more vibrant world. Building upon core competencies in microfabrication and precision coating, the company delivers products to markets including displays, electronic devices, and optical films.

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